Development and calibration of physical models for processes relevant to deep submicron technologies

Erlebach, A.; Benistant, F.; Krause, U.; Matveev, D.; Strecker, N.; Meniailenko, V.; Mickevicius, R.; Simeonov, S.; Al-Bayati, A.; Tandon, S.; Gallo, B.; Foad, M. A.; Ng, B.; Trowbridge, T.; Posselt, M.

Development and calibration of physical models for processes relevant to deep submicron technologies

Erlebach, A.; Benistant, F.; Krause, U.; Matveev, D.; Strecker, N.; Meniailenko, V.; Mickevicius, R.; Simeonov, S.; Al-Bayati, A.; Tandon, S.; Gallo, B.; Foad, M. A.; Ng, B.; Trowbridge, T.; Posselt, M.

Informations can be requested. Email: M.Posselt@fz-rossendorf.de

Lecture (Conference)
13th International Conference on Ion Implantation Technology, Alpbach, Austria, September 17-22, 2000

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