Atomistic simulation of ion implantation into different polytypes of SiC


Atomistic simulation of ion implantation into different polytypes of SiC

Ster, A.; Posselt, M.; Hallen, A.; Janson, M.

Informations can be requested. Email: M.Posselt@fz-rossendorf.de

  • Poster
    13th International Conference on Ion Implantation Technology, Alpbach, Austria, September 17-22, 2000
  • Contribution to external collection
    Proc. 2000 Int. Conf. on Ion Implantation Technology, Alpbach, Austria, September 17 -22, eds.: H. Ryssel, L. Frey, J. Gyulai, H. Glawischnig, IEEE, Piscataway, USA, 2000, IEEE Publications 00EX432, p. 220

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