Defect production and evolution during and after ion implantation studied by a combination of time-ordered BCA and MD simulations

Defect production and evolution during and after ion implantation studied by a combination of time-ordered BCA and MD simulations

Posselt, M.

• Contribution to external collection
  Proc. 1998 Int. Conf. on Ion Implantation Technology, Kyoto, Japan, June 22-26, 1998, eds.: J. Matsuo, G. Takaoka, Y. Yamada; IEEE, Piscataway, USA, 1998, IEEE Publications 98EX144, p. 678

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