Mass separated Focused Ion Beams using alloy Liquid Metal Ion Sources

An overview of the research activities of the FIB group in the Research Centre
Rossendorf is given. More in detail the fabrication technology of alloy LMIS as well
as their characterization is discussed. The FIB system IMSA-100 is briefly
introduced and typical applications are presented: writing implantation of Co ions
into a heated Si target in order to create maskless sub-micron CoSi2 structures,
bombardment of semiconductor materials with different ions in a wide range of
current density, dose and temperature allows to study the damage creation and
dynamic annealing process.