Plasma immersion ion implantation using a glow discharge source with controlled plasma potential
Plasma immersion ion implantation using a glow discharge source with controlled plasma potential
Ueda, M.; Gomes, G. F.; Berni, L. A.; Rossi, J. O.; Barroso, J. J.; Beloto, A. F.; Abramof, E.; Reuther, H.
A DC glow discharge plasma source was used in a PIII experiment.
- Nuclear Instruments and Methods B 161-163 (2000) 1064-1068
Permalink: https://www.hzdr.de/publications/Publ-3558
