High Dose Nitrogen and Carbon Shallow Implantations in Silicon by PIII


High Dose Nitrogen and Carbon Shallow Implantations in Silicon by PIII

Ueda, M.; Reuther, H.; Guenzel, R.; Beloto, A. F.; Abramof, E.; Berni, L. A.

Silicon was implanted with high doses of nitrogen and carbon Shallow by PIII.

  • Lecture (Conference)
    Conference on Ion Beam Modification of Materials 2000, Rio Grande do Sul, Brazil, 3.-8.Sept.2000

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