Evidence for diffusion-limited kinetics of ion-beam-induced epitaxial crystallization in silicon
Evidence for diffusion-limited kinetics of ion-beam-induced epitaxial crystallization in silicon
Heera, V.; Henkel, T.; Kögler, R.; Skorupa, W.
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Physical Review B 52 (1995) 22 pp. 15 776-784
DOI: 10.1103/PhysRevB.52.15776
Cited 56 times in Scopus
Permalink: https://www.hzdr.de/publications/Publ-385