Electrical characterization of thin SiO2 layers containing Ge / Si nanoclusters

Gebel, T.; von Borany, J.; Rebohle, L.; Skorupa, W.; Thees, H.-J.; Wittmaack, M.; Stegemann, K.-H.

no abstract delivered from author

Poster
NATO Advanced Study Institute, "Defects in SiO2 and related Dielectrics: Science and Technology", Erice (Sizilien, Italien), 8.-20.04.2000

Permalink: https://www.hzdr.de/publications/Publ-4863