Microstructure and electrical properties of Ge and Si - implanted SiO2 layers
Microstructure and electrical properties of Ge and Si - implanted SiO2 layers
Gebel, T.
no abstract delivered from author
Keywords: Nanocluster
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Lecture (others)
Vortrag an der University of Catania, Italien (11. Oktober 2000)
Permalink: https://www.hzdr.de/publications/Publ-4869