Depth profiles of Argon incorporated into Boron Nitride films during preparation and their temperature dependent evolution
Depth profiles of Argon incorporated into Boron Nitride films during preparation and their temperature dependent evolution
Deyneka, N.; Zhang, X. W.; Boyen, H.-G.; Ziemann, P.; Fukarek, W.; Kruse, O.; Möller, W.
no abstract
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Diamond and Related Materials 12 (2003) 37
DOI: 10.1016/S0925-9635(02)00247-9
Cited 16 times in Scopus
Permalink: https://www.hzdr.de/publications/Publ-5123
