Temporal evolution of dot patterns during ion sputtering


Temporal evolution of dot patterns during ion sputtering

Bobek, T.; Facsko, S.; Kurz, H.; Dekorsy, T.; Xu, M.; Teichert, C.

The temporal evolution of the morphology of GaSb surfaces induced by ion bombardment is investigated.
The erosion process with normal incident argon ions forms a regular dot pattern that shows an increase of
ordering among the dots with increasing sputtering time. The pattern stabilizes to a highly uniform, hexagonally
ordered dot pattern for very long times. The degree of ordering is determined by quantitative analysis of
the surface roughness and the power spectral density of the surface pattern using atomic force microscopy. A
comparison of the experimental results with numerical integrations of the unstabilized Kuramoto-Sivashinsky
equation shows that this equation cannot reproduce essential details of the experimental pattern observed.

Keywords: ion sputtering; pattern formation; continuum equations; Kuramoto-Sivashinsky equation

  • Physical Review B 68 (2003) 085324

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