Charge trapping in high-dose Ge-implanted and Si-implanted silicon dioxide thin films

Charge trapping in high-dose Ge-implanted and Si-implanted silicon dioxide thin films

Nazarov, A. N.; Osiyuk, I. N.; Tyagulskii, I. P.; Lysenko, V. S.; Gebel, T.; Skorupa, W.

• Contribution to external collection
  in: "Silicon Nitride and Silicon Dioxide Thin Insulating Films VII", ed. by R. E. Sah et al., ECS Inc., Pennington USA, v. 2003-02, p. 144

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