Ion implantation of NiTi alloy: surface processes and properties

The superelastic or memory shape NiTi alloy has big potential for biomedical applications, but due to the high nickel content there are restrictions against it. It has been shown, that ion implantation is a very versatile method to reduce the surface nickel content and modify the structure, by this improve the surface properties for biomaterials applications. The understanding of the mechanism of the Ni depleted layer formation and growth is still limited, but it is a key for achieving control and optimization of the process. The aim of this contribution is to study the surface processes of TiNi alloys during ion implantation, especially the phenomena of Ni depletion of NiTi surface to improve the biocompatibility.
N, O and Ar ion implantation of the NiTi samples was performed by means of plasma immersion ion implantation at different parameters: ion energy (20 - 40 keV and 200 keV), fluence (10 17 - 10 18 cm -2), substrate temperature (RT - 400 °C). The implanted layers were examined by Auger electron spectroscopy, grazing incidence X-ray diffraction analysis and transmission electron microscopy. The corrosion resistance and biocompatibility were investigated by the electrochemical corrosion analysis, cell culture and blood compatibility tests, respectively.
Nickel depleted surface layers of TiOx or TiNx are formed during oxygen or nitrogen implantation, respectively. Below this a nickel enriched zone up to 300 nm is found, with the possible phases Ni4Ti3 and Ni2.67Ti1.33. This indicates a reactive diffusion process as main control mechanism of Ni transport. Finally, any correlation of corrosion, chemical and microstructure properties of modified NiTi surfaces to the biocompatibility are discussed.