Real-time and in-situ structural design of functional NiTi SMA thin films

The real-time structural design of magnetron sputtered NiTi SMA (shape memory alloy) thin films is reported. During deposition the phase content was followed in situ by synchrotron x-ray diffraction and controlled by varying the power of co-sputtering NiTi plus Ti for otherwise fixed deposition parameters. This method allows an optimization of the thin film in respect to its functional properties like phase transition temperature or adhesion as well as an understanding of the actual growth process by revealing temporary intermediate growth states (precipitates) and diffusion processes during film growth. The method is neither restricted to the sputter material (NiTi) nor to the controlling parameter (power) chosen, but immediately applicable to a large class of materials as well as general enough for other deposition parameters.