Anisotropy patterning of amorphous CoFeSiB films by Heion irradiation

The alteration of magnetic properties in magnetic thin films by ion radiation has gained increasing attention in recent years. Here, we present data on the local alteration of the magnetic anisotropy axis in amorphous soft magnetic FeCoBSi films by He-ion irradiation in an applied magnetic in-plane field. Sputtered CoFeSiB (thickness 30 nm) were irradiated with 5 keV He-ions. A magnetic field of 600 Oe was applied during irradiation aligned orthogonal to the initial easy axis of anisotropy. Above a critical fluence an alignment of anisotropy in the applied field direction is observed by MOKE magnetometry and complementary domain observation by Kerr microscopy. Using irradiation together with photolithography the films were irradiated locally, thus resulting in anisotropypatterned structures. Domain patterns in different elements with varying angles of anisotropy and edge orientation, separating regions of different anisotropy alignment, are shown. The influence of the patterning on the (still) full film reversal is discussed in detail.