Development of New Technique for High-Energy Secondary-Electron Measurements in Plasma Immersion Ion Implantation

Development of New Technique for High-Energy Secondary-Electron Measurements in Plasma Immersion Ion Implantation

Nakamura, K.; Mändl, S.; Brutscher, J.; Günzel, R.; Möller, W.

• Plasma Sources Science & Technolgy 6 (1997) pp. 86-90

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