Two recipies to stabilize the substrate melting in FLASiC structures
Two recipies to stabilize the substrate melting in FLASiC structures
Voelskow, M.; Mücklich, A.; Stoemenos, J.; Skorupa, W.
It could be shown that both, the introduction of a melt stop layer as well as the introduction of a layer with reduced melting temperature are usefull methods for the homogenisation of the melting depth at the bulk silicon surface in FLASIC structures.
Keywords: Flash lamp annealing silicon carbide
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Lecture (others)
Program Seminar of the Institute of ion beam physics and material research Rossendorf, 13.-15.06.2005, Schmochtitz, BRD
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