Two recipies to stabilize the substrate melting in FLASiC structures


Two recipies to stabilize the substrate melting in FLASiC structures

Voelskow, M.; Mücklich, A.; Stoemenos, J.; Skorupa, W.

It could be shown that both, the introduction of a melt stop layer as well as the introduction of a layer with reduced melting temperature are usefull methods for the homogenisation of the melting depth at the bulk silicon surface in FLASIC structures.

Keywords: Flash lamp annealing silicon carbide

  • Lecture (others)
    Program Seminar of the Institute of ion beam physics and material research Rossendorf, 13.-15.06.2005, Schmochtitz, BRD

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