TEM-Investigation of Si(001) Modified by Pr Implantation
TEM-Investigation of Si(001) Modified by Pr Implantation
Mücklich, A.; Kögler, R.; Eichhorn, F.
TEM-Investigation of Si(001) Modified by Pr Implantation
Keywords: high-K dielectrics; Pr oxide; Pr silicide; Pr silicate
-
Poster
Microscopy Conference, 28.08.-02.09.2005, Davos, Schweiz -
Contribution to proceedings
Microscopy Conference 2005, 28.08.-02.09.2005, Davos, Switzerland
Permalink: https://www.hzdr.de/publications/Publ-7592