Thin highly sensitive piezoresitive cantilevers - fabrication of ultra-shallow pn-junctions

Schmidt, B.; Zier, M.

No abstract required

Keywords: boron implantation; low energy implantation; RTA annealing; piezoresistors; SIMS profiles

Lecture (others)
EU-IP 515739: Technology for the production of massively parallel intelligent cantilever- probe platforms for nanoscale analysis and synthesism, PRONANO Meeting, Vienna, 18.-19.10.2005, Vienna, Austria

Permalink: https://www.hzdr.de/publications/Publ-8064