Fabrication of Si nanocrystals for nonvolatile memories using ion beams


Fabrication of Si nanocrystals for nonvolatile memories using ion beams

Müller, T.; Heinig, K.-H.; Schmidt, B.; Röntzsch, L.; Stegemann, K.-H.

Abstract is not available.

Keywords: ion implantation; nanocluster; atomistic computer simulations; nonvolatile memory

  • Invited lecture (Conferences)
    Intern. Workshop on Semiconductor Nanocrystals (SEMINANO), 10.-12.09.2005, Budapest, Hungary

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