Fabrication of Si nanocrystals for nonvolatile memories using ion beams
Fabrication of Si nanocrystals for nonvolatile memories using ion beams
Müller, T.; Heinig, K.-H.; Schmidt, B.; Röntzsch, L.; Stegemann, K.-H.
Abstract is not available.
Keywords: ion implantation; nanocluster; atomistic computer simulations; nonvolatile memory
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Invited lecture (Conferences)
Intern. Workshop on Semiconductor Nanocrystals (SEMINANO), 10.-12.09.2005, Budapest, Hungary
Permalink: https://www.hzdr.de/publications/Publ-8241