Halogen PIII for high-temperature oxidation protection of TiAl

Richter, E.; Yankov, R.; Möller, W.; Donchev, A.; Schütze, M.

wird nachgereicht

Keywords: TiAl high temprature oxidation resistance; plasma immersion ion implantation; halogen

Poster
8th International Workshop on Plasma-Based Ion implantation and Deposition, 20.-25.09.2005, Chengdu, China

Permalink: https://www.hzdr.de/publications/Publ-8245