Structural and magnetic properties of Mn-implanted Si


Structural and magnetic properties of Mn-implanted Si

Zhou, S.; Potzger, K.; Mücklich, A.; Eichhorn, F.; Schell, N.; Grötzschel, R.; Schmidt, B.; Skorupa, W.; Helm, M.; Fassbender, J.; Geiger, D.

Structural and magnetic properties in Mn-implanted, p-type Si were investigated. High resolution structural analysis techniques such as synchrotron x-ray diffraction revealed the formation of MnSi1.7 nanoparticles already in the as-implanted samples. Depending on the Mn fluence, the size increases from 5 nm to 20 nm upon rapid thermal annealing. No significant evidence is found for Mn substituting Si sites either in the as-implanted or annealed samples. The observed ferromagnetism yields a saturation moment of 0.21µB per implanted Mn at 10 K, which could be assigned to MnSi1.7 nanoparticles as revealed by a temperature-dependent magnetization measurement.

Keywords: Diluted magnetic semiconductor; Si; Ion implantation

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