Use of metal plasma immersion ion implantation and deposition for preparation of hemocompatible titanium-based coatings

Metal plasma immersion ion implantation and deposition (MePIIID) provides a useful technique to control composition and structure of metal-based thin films. By this method Ti-based coatings such as Ti nitrides, oxides or oxynitrides are formed on the objects with an irregular shape from a plasma produced by cathodic arc evaporation of Ti under addition of nitrogen and/or oxygen to the ambient near the substrate. Coating with Ti oxide or Ti-nitride-oxide (TiNOX) is a promising method to improve the blood compatibility of materials for use as medical implants.