Preparation of SiO₂ Films with embedded Si Nanocrystals by Reactive RF-Magnetron Sputtering

Preparation of SiO₂ Films with embedded Si Nanocrystals by Reactive RF-Magnetron Sputtering

Seifarth, H.; Grötzschel, R.; Markwitz, A.; Matz, W.; Nitzsche, P.; Rebohle, L.

• Thin Solid Films 330 (1998) 202-205
  DOI: 10.1016/S0040-6090(98)00609-9
  Cited 68 times in Scopus

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