Ion-induced stress relaxation during magnetron sputtering deposition of cubic boron nitride thin films
Ion-induced stress relaxation during magnetron sputtering deposition of cubic boron nitride thin films
Abendroth, B.; Gago, R.; Eichhorn, F.; Kolitsch, A.; Möller, W.
There is no abstract provided.
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Lecture (Conference)
PSE2004, 13.-17.09.2004, Garmisch-Partenkirchen, Germany
Permalink: https://www.hzdr.de/publications/Publ-9815