Bonding environment in films deposited from Ar/CH4 and Ar/CH4/N2 ECR discharge: effect of voltage polarization on the growth process

Bonding environment in films deposited from Ar/CH4 and Ar/CH4/N2 ECR discharge: effect of voltage polarization on the growth process

Camero, M.; Gago, R.; Gómez-Aleixandre, C.; Albella, J. M.

There is no abstract provided.

  • Poster
    PSE2004, 13.-17.09.2004, Garmisch-Partenkirchen, Germany

Permalink: https://www.hzdr.de/publications/Publ-9822