Effects of ion beam induced excess vacancies in silicon: analysis, modelling, application

Effects of ion beam induced excess vacancies in silicon: analysis, modelling, application

Kögler, R.; Eichhorn, F.; Mücklich, A.; Skorupa, W.; Serre, C.; Perez-Rodriguez, A.

Effects of ion beam induced excess vacancies in silicon are discussed.

Keywords: vacancies; silicon; defect engineering

  • Lecture (Conference)
    5th Int. Conf. on Ion Implantation and other Applications of Ions and Electrons (ION2004), 14.-17.06.2004, Kazimierz Dolny, Poland

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