Microstructural investigation of Sn nanoclusters in double-energy implanted and annealed SiO₂ layers with cross-sectional TEM

Microstructural investigation of Sn nanoclusters in double-energy implanted and annealed SiO₂ layers with cross-sectional TEM

Markwitz, A.; Grötzschel, R.; Heinig, K.-H.; Rebohle, L.; Skorupa, W.

• Nuclear Instruments and Methods in Physics Research B 152 (1999) 319-324

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