Synthesis and characterization of boron-oxygen-hydrogen thin films at low temperatures


Synthesis and characterization of boron-oxygen-hydrogen thin films at low temperatures

Music, D.; Kölpin, H.; Atiser, A.; Kreissig, U.; Bobek, T.; Hadam, B.; Mertens, R.; Schneider, J. M.

We have studied the influence of synthesis temperature on chemical composition and mechanical properties of X-ray amorphous boron–oxygen–hydrogen (B–O–H) films. These B–O–H films have been synthesized by RF sputtering of a B-target in an Ar atmosphere. Upon increasing the synthesis temperature from room temperature to 550 °C, the O/B and H/B ratios decrease from 0.73 to 0.15 and 0.28 to 0.07, respectively, as determined by elastic recoil detection analysis. It is reasonable to assume that potential sources of O and H are residual gas and laboratory atmosphere. The elastic modulus, as measured by nanoindentation, increases from 93 to 214 GPa, as the O/B and H/B ratios decreases within the range probed. Hence, we have shown that the effect of impurity incorporation on the elastic properties is extensive and that the magnitude of the incorporation is a strong function of the substrate temperature.

Keywords: amorphous materials; sputtering; machanical properties

  • Materials Research Bulletin 40(2005)8, 1345-1352

Permalink: https://www.hzdr.de/publications/Publ-8152