Multimodal electronic–vibronic spectra of luminescence in ion-implanted silica layers

Thermally oxidized SiO2 layers of 100 and 500 nm thickness have been implanted by oxygen and sulfur ions with a dose of 3x1016 and 5x1016 ions/cm2, respectively, leading to an atomic dopant fraction of about 4 at.% at the half depth of the SiO2 layers. The cathodoluminescence spectra of oxygen and sulfur implanted SiO2 layers show besides characteristic bands a sharp and intensive multimodal structure beginning in the green region at 500nm over the yellow-red region extending to the near IR measured up to 820 nm. The energy step differences of the sublevels amount on average 120meV and indicate vibration associated electronic states, probably of O2- interstitial molecules, as we could demonstrate by a respective configuration coordinate model.