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1 PublicationThermally induced formation of metastable nanocomposites in amorphous Cr-Zr-O thin films deposited using reactive ion beam sputtering
Rafaja, D.; Wüstefeld, C.; Abrasonis, G.; Braeunig, S.; Baehtz, C.; Hanzig, F.; Dopita, M.; Krause, M.; Gemming, S.
Abstract
Successive crystallization ofamorphous Cr-Zr-O thin films, formation of the (Cr,Zr)2O3/(Zr,Cr)O2 nanocomposites and the thermally induced changes in the hexagonal crystal structure of metastable (Cr,Zr)2O3 were investigated by means of in situ high-temperature synchrotron diffraction experiments up to 1100 °C. The thin films were deposited at room temperature by using reactive ion beam sputtering, and contained 3–15 at.% Zr. At low Zr concentrations, chromium-rich (Cr,Zr)2O3 crystallized first, while the crystallization of zirconium-rich (Zr,Cr)O2 was retarded. Increasing amount of zirconium shifted the onset of crystallization in both phases to higher temperatures. For 3 at.% of zirconium in amorphous Cr-Zr-O, (Cr,Zr)2O3 crystallized at 600 °C. At 8 at.% Zr in the films, the crystallization of (Cr,Zr)2O3 started at 700 °C. At 15 at.% Zr, the Cr-Zr-O films remained amorphous up to the annealing temperature of 1000 °C.Metastable hexagonal (Cr,Zr)2O3 accommodated up to ~3 at.% Zr. Excess of zirconium formed tetragonal zirconia, which was stabilized by chromium.
Keywords: Metastable oxides; In situ synchrotron diffraction; Crystallization; Reactive ion beam sputtering; Rutherford backscattering spectrometry
Involved research facilities
- Ion Beam Center DOI: 10.17815/jlsrf-3-159
- Rossendorf Beamline at ESRF DOI: 10.1107/S1600577520014265
Related publications
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 23966) publication
- DOI: 10.1107/S1600577520014265 is cited by this (Id 23966) publication
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Thin Solid Films 612(2016), 430-436
DOI: 10.1016/j.tsf.2016.06.038
Cited 8 times in Scopus
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