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1 PublicationComparison of TiN and Ti1-xAlxN coatings deposited on Al using plasma immersion ion implantation assisted deposition
Mukherjee, S.; Prokert, F.; Richter, E.; Möller, W.
Abstract
TiN and Ti1-xAlxN coatings were deposited on Al substrates using the plasma immersion ion implantation and deposition technique, employing a filtered Ti and Ti0.5Al0.5 cathodic arc in a nitrogen atmosphere. Negative pulsed bias voltages between 0 to 4.0 kV were applied with varying duty cycles, at a constant time-averaged bias. Stress measurements using X-ray diffraction reveal an increase and then a decrease in the intrinsic compressive stress at increasing on-time bias, more pronounced for Ti1-xAlxN coatings. A bias dependent preferred orientation is observed for both the coatings, with [200] being the preferred orientation at higher bias. The hardness always reduces for TiN coatings with increase in bias, whereas for Ti1-xAlxN it shows a reverse trend. The results are qualitatively explained by the role played by Al in Ti1-xAlxN. The results indicate that the peak bias plays a more dominant role than time averaged bias.
Keywords: Plasma immersion ion implantation assisted deposition; titanium nitride; preferred orientation; stress
- Surface and Coatings Technology 200 (2005)7 2459-2464
Permalink: https://www.hzdr.de/publications/Publ-6216