Ion Induced Nanostructures
We study processes during the interaction of low energy (10 eV – 50 keV) ions with different charge states with materials, especially for the controlled modification and nano-patterning of their surfaces. Such modifications can be material removal through sputtering of surface atoms but also near surface ion beam mixing, ion beam induced defect engineering, or implantation of guest atoms (see figure below). Bottom up as well as top down surface structuring can be achieved through the use of either broad beam irradiation or focused ion beam irradiation.
The first one allows to roughen, smoothen, or clean technical surfaces. Furthermore, the energy deposited by the continuous ion impact drives the surface out of equilibrium inducing many processes on the surface and the sub-surface region.
Alternatively, focused ion beams allow the top down structuring of surfaces or surface near regions with a high spatial resolution compatible with modern nanostructure fabrication requirements. In our group we employ a wide range of focused ion beams from very light nobel gas ions to small heavy ion clusters to understand the behaviour of materials and create state-of-the-art nanostructures.
Our main research topics are:
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Morphology modification of Si nanopillars under ion irradiation at elevated temperatures: plastic deformation and controlled thinning to 10 nm
X. XuORC, K.-H. Heinig, W. Möller, H.-J. Engelmann, N. KlingnerORC, A. Gharbi, R. Tiron, J. Borany, G. HlawacekORC
Stationary beam full-field transmission helium ion microscopy using sub-50 keV He+: Projected images and intensity patterns
M. Mousley, S. Eswara, O. de Castro, O. Bouton, N. KlingnerORC, C. T. Koch, G. HlawacekORC, T. Wirtz
Lithium Ion Beams from Liquid Metal Alloy Ion Sources
W. Pilz, P. Mazarov, N. Klingner, S. Bauerdick, L. Bischoff