Machine |
Details |
Electron beam writer RAITH 150 TWO
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- Manufacturer: RAITH GmbH
- Applications:
- Electron source:
- 30 kV Schottky thermal field electron emitter ZrO/W
- Sample size: ≤ 4 inch wafer
- Smallest feature size: sub 8 nm
- Sample stage with laser interferrometer
- Height sensing and FBMS mode available
- GDSII editor for generation of complex structure design on several layers with individual dose factor assignment for single structrure elements
- NanoPECSTM software suite for the correction of proximitty effects
Responsible: Dr. Y. Georgiev, Y.Georgiev@hzdr.de, 0351 / 260 - 2321
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Electron beam writer RAITH eLiNE plus
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- Manufacturer: RAITH GmbH
- Applications:
- Nanolithography
- Imaging
- Nanoengineering
- Electron source:
- 30 kV Schottky thermal field electron emitter ZrO/W
- Sample size: ≤ 3 inch wafer
- Smallest feature size: sub 5 nm
- Sample stage with laser interferrometer
- 4 integrated nanomanipulators for e.g. nanoprobing
- Height sensing mode available
- GDSII editor for generation of complex structure design on several layers with individual dose factor assignment for single structrure elements
- NanoPECSTM software suite for the correction of proximitty effects
Responsible: Dr. Y. Georgiev, Y.Georgiev@hzdr.de, 0351 / 260 - 2321
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Reactive ion beam etcher IonSys 500
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- Manufacturer: ROTH & RAU AG
- Applications:
- Non-selective etching by sputtering with Ar gas
- Anisotropic etching of:
- Metals
- Magnetic stacks
- SiO2
- Sample size: ≤ 6 inch wafer
- Ar source
- Etch gas: CF4
- Helium backside cooling
- Sample tilting: ≤ 90°
- Sample rotation: ≤ 10 rpm
- Secondary Ion Mass Spectrometer (SIMS) manufactured by Hiden Analytical, UK for end point detection
Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366>
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UHV evaporation tool BETty
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- Manufacturer: BESTEC GmbH
- Base pressure <10-9 mbar
- E-gun evaporator (7 pockets)
- Thermal evaporator (Al)
- Temperature range 130 K – 600 K
- Tilt range ±45°
- Sputter gun (sample cleaning)
- Application: Metal film deposition
Responsible: Dr. Y. Georgiev, Y.Georgiev@hzdr.de, 0351 / 260 - 2321
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Cryogenic probe station CPX-VF
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- Manufacturer: LAKESHORE
- Applications:
- C-V measurements
- I-V measurements
- 4-Probe measurements
- Hall measurements
- Microwave measurements
- Electro-optical measurements
- all measurements can be combined with out-of-plane vertical field superconducting magnetic measurements
- Sample size: ≤ 2 inch wafer
- Magnetic field: ∓ 2,5 T
- Orientation of the magnetic field: vertical out-of-plane
- Temperature range: 4.5 K – 400 K
- Available sample holder:
- grounded sample holder
- coaxial sample holder
- tiltable sample holder
- Orientation of the magnetic field can be changed to in-plane
- Measuring instruments:
- AGILENT 4156C Precision Semiconductor Parameter Analyzer
- LakeShore 625 Superconductiong magnet power supply
- LakeShore 340 Temperature controller
- LakeShore 332 Temperature controller
- Incoupling of a laser signal (λ = 473nm / 785nm) possible
- Multiple radiation shields for best low temperature performance
- Minimize sample condensation during cool-down
- True 90° probing
Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366>
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Cryogenic probe station TTP-4A
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- Manufacturer: LAKESHORE
- Applications:
- C-V measurements
- I-V measurements
- Microwave measurements
- Electro-optical measurements
- Sample size: ≤p to 2 inch wafer
- Temperature range: 4.5 K – 400 K
- Available sample holder:
- grounded sample holder
- coaxial sample holder
- Measuring instruments:
- AGILENT 4156C Precision Semiconductor Parameter Analyzer
- AGILENT 34410A Digital Multimeter
- KEITHLEY 2400 Source Meter
- LakeShore 332 Temperature controller
- Incoupling of a laser signal (λ = 473nm / 785nm) possible
- Radiation shield for best low temperature performance
- Minimize sample condensation during cool-down
- True 90° probing
Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366>
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Mechanical controlled break junction setup
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- Applications:
- Electrical characterization of molecular structures
- at room temperature
- in liquid environment
- Currently investigated molecules:
- Selenium metal complexes
- Polythiophenes
- Bucky-bowl structures (e.g. Corannulene)
- Currently investigated solvents:
- Current measurement in the range of Femto-Ampere due to electrical and magnetic shielding technology
- 4 setups
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Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366
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Cryogenic UHV break junction setup
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- Applications:
- I-V measurements
- Ploting histograms of the conductance
- Inelastic electron tunneling spectroscopy (IETS)
- Point-contact spectroscopy (PCS)
- Temperature range: 5 K – 300 K
- Pressure (at low temperatures): 5*10-5 mbar
- In situ deposition of molecules into the break junctions
- Via thermal evaporation of e.g. C60
- Depostion rate: 0,2 Å/s - 0,6 Å/s
- Thicknesses of ¼ up to 1 monolayer
- Measuring instruments:
- KEITHLEY 2400 Source Meter
- KEITHLEY 6430 Sub Femtoamp Remote Source Meter
- LakeShore 331 Temperature controller
- YOKOGAWA 7651 Programmable DC Source
Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366
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Laser cutter skylaser MARK 20
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- Manufacturer: PFEIFER technology & innovation
- Sample size:
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Plasma cleaner PICO
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- Manufacturer: DIENER ELECTRONIC GmbH + Co. KG
- Applications:
- Activating of semiconductors
- Cleaning of semiconductors
- Etching of semiconductors
- Plasmapolymerisation
- Sample size: ≤ 4 inch wafer
- Gases: O2, Ar
- Frequency: 2,45 GHz
- Power: 0 - 300W
- Faraday box for electrical sensitive components
- Piranisensor is measuring the pressure below 10 mbar
- Power display of the generator
- Timer for setting the process time up to 999,9 min
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High vacuum oven XERION X-TUBE
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- Manufacturer: XERION ADVANCED HEATING® Ofentechnik GmbH
- Sample size: ≤ 4 inch wafer
- Temperature range:up to 800°C
- Pressure: down to 4*10-7 mbar
- Gas: N2
- Ramp rates for heating up and cooling down
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Optical microscope OPLYMPUS BX51
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- Manufacturer: OLYMPUS GmbH
- Magnifications: 5x, 10x, 20x, 50x, 100x, 250x
- Dark field and bright field mode
- Transmitted light and reflected light mode
- Taking images with the installed camera (Carl Zeiss Axio Cam MRc)
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- tool for ...
- Application: ...
Responsible: ...
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Planned experimental setups |
Cluster deposition setup
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- Applications:
- Generation of metal- or MnSm (M = Mo, W) clusters
- Electrical characterization of mass-selected clusters using mechanically controllable break junctions (MCBJs)
- Investigation of electron transport properties and Chevrel phases of MnSm clusters
- Insitu cluster generation by pulsed arc cluster ion source (PACIS)
- Mass separation by time-of-flight mass spectrometer with reflectron
- Generation of metal clusters due to gas supply and annealing steps
- Insitu deposition of the clusters into a MCBJ via soft landing method
- Pressure: ≥ 10-7 mbar
Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366
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- Application
- Optical characterization of nanomechanical resonators
Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366
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